AWSC 宏捷科技
Img

0.15um E-pHEMT

Features

- MOCVD Epitaxial, High Gm
- ESD Protection Diode
- 0.15um T-Gate Enhancement Mode FET
- 1,400 Ohm/Square High Thin Film Resistor
- 2-Layers Metal Technology
- Gold (Au) Metallization
- PECVD Si3N4 Capacitor
- Airbridge Process
- Copper Pillar Bump Process

Specification

ParameterTypicalUnit
E-pHEMTIds@Vgs=0.7V130mA/mm
Ids@Vgs=0V 0.0001mA/mm
VPo 0.3 V
Gm0@0.7V 1000 mS/mm
Ron@0.7V 1.4 mm*ohm
BVdgo 12 V
Ft 105 GHz
Fmax 117 GHz
NFmin
(@ 6 GHz)
0.3 dB

Applications

- LNB
- Pre-5G: Sub-6GHz
- 5G: 28GHz

© Copyright 2023 Advanced Wireless Semiconductor Company. All Rights Reserved.