0.15um E-pHEMT
Features
- MOCVD Epitaxial, High Gm
- ESD Protection Diode
- 0.15um T-Gate Enhancement Mode FET
- 1,400 Ohm/Square High Thin Film Resistor
- 2-Layers Metal Technology
- Gold (Au) Metallization
- PECVD Si3N4 Capacitor
- Airbridge Process
- Copper Pillar Bump Process
Specification
Parameter | Typical | Unit |
E-pHEMT | Ids@Vgs=0.7V | 130 | mA/mm |
Ids@Vgs=0V | 0.0001 | mA/mm |
VPo | 0.3 | V |
Gm0@0.7V | 1000 | mS/mm |
Ron@0.7V | 1.4 | mm*ohm |
BVdgo | 12 | V |
Ft | 105 | GHz |
Fmax | 117 | GHz |
NFmin (@ 6 GHz) | 0.3 | dB |
Applications
- LNB
- Pre-5G: Sub-6GHz
- 5G: 28GHz