AWSC 宏捷科技
Img

0.25um ED pHEMT

Features

- MOCVD Epitaxial
- ESD Protection Diode
- 0.25um T-Gate N-Channel Depletion Mode FET
- 0.25um T-Gate N-Channel Enhancement Mode FET
- P-Channel FET (Optional)
- 1,400 Ohm/Square Thin Film Resistor
- 2-Layers Metal Technology
- Gold (Au) Metallization
- PECVD Si3N4 Capacitor and Passivation
- Backside Via Process or Copper Pillar Bump Process

Specification

ParameterTypicalUnit
D-pHEMTIdss270mA/mm
Imax@0.6V 420 mA/mm
VPo -1V
Gm0@0V 350 mS/mm
Ron@0V 1.3 mm*ohm
BVdgO10.5 V
Ft 55 GHz
Fmax 70 GHz
E-pHEMTIds@Vgs=0.7V120mA/mm
Ids@Vgs=0V 0.0001mA/mm
VPo 0.25 V
Gm0@0.7V 650 mS/mm
Ron@0.7V 1.5 mm*ohm
BVdgo 10.5 V
Ft 69 GHz
Fmax 96 GHz
NFmin
(@ 6 GHz)
0.51dB

Applications

- SW, LNA, PA For 5G
- Pre-5G: Sub-6GHz

© Copyright 2023 Advanced Wireless Semiconductor Company. All Rights Reserved.